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Key Responsibilities:
CMP Process Optimization & Flow Definition: Defining and tuning CMP process windows across Oxide, STI, Cu/Al Interconnects, Tungsten Plugs, Poly, and specialty films (SiN, SiPh, Power devices).
Consumables Qualification & Cost Reduction: Qualifying next-generation slurries, polishing pads, conditioner disks, post-CMP cleaning chemistries, and retain rings.
Defectivity & Yield Enhancement: Driving systematic reduction of CMP defects (micro-scratches, slurry residue, corrosion, pitting, delamination) using advanced DOE and root-cause methodologies.
Equipment & Endpoint Integration: Partnering with equipment teams on AMAT (Mirra/Reflexion) and EBARA (FREX/F-REX) polishers, optical/eddy-current endpoint control systems, and brush box cleaners.
Excursion Resolution: Directing structured 8D and PFMEA investigations for post-CMP cleaning failures and inline yield excursions.
Qualifications:
Education: Bachelor's, Master's, or Ph.D. in Chemical Engineering, Materials Science, Chemistry, or Microelectronics.
Experience: 7-10 years of hands-on CMP process engineering experience in a 200mm or 300mm wafer fab environment.
If you are interested in exploring this role, or if you have relevant industry contacts who might be interested, please reach out directly with a CV to: [Confidential Information]
EA: 94C3609 | R22105422
Job ID: 153366917
Skills:
optical eddy-current endpoint hardware integration, EHS compliance, Fmea, chamber modifications, root-cause failure analysis, 8D, platen conditioning system enhancements, CMP equipment engineering, tool retrofits